Tantalum sputtering targets Can Be Fun For Anyone
Tantalum sputtering targets Can Be Fun For Anyone
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Layer termination from ellipsometric info is totally built-in into Aeres®. Several different multi-wavelength and spectroscopic ellipsometry options can be found While using the ion beam sputter deposition method.
In-situ optical checking and Management is offered by way of Angstrom’s optical checking & Management offer.
Concentrate on rotation and carousel indexing Every single have torque feeling, stopping any course of action troubles on account of slips or jams in rotation.
The dimensions, place, and kit ratio of each and every World are optimized to provide the absolute best attainable movie thickness uniformity.
Our Reticle® ion beam sputter deposition devices are designed and engineered to generate specific optical movies of the highest purity, density, and balance.
Variable angle stages permit for pretty impressive slim film approaches. On the other hand, one of its major problems is reproducibility. The substrate is often established at a very oblique angle in relation to your source, and also the movies are certainly delicate to your precision of the angle.
Angstrom Engineering® types and engineers Every single Reticle® platform to deliver our partners during the optics community the ability to develop the films they will need with fantastic purity, density, and uniformity, all inside a very repeatable and automated manner.
Our unique layout permits direct or oblique checking of the variable angle stage, getting rid of the necessity for tooling things or possibly a witness glass changer. Find out more regarding the Optical Checking & Command bundle in this article.
IBSD processes may also hire a secondary ion resource for substrate cleansing and energetic help, substrate heating for reactive deposition, As well as in-situ optical monitoring or ellipsometry for critical layer thickness termination.
All standard Reticle® platforms incorporate an extra gridless close-Hall ion source with hollow cathode neutralizer.
The deposition ion supply is directed toward a fabric goal that has been optimized in both dimension and situation for your required deposition geometry.
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A very low-frequency neutralizer assures secure beam operation without the need of contamination from a traditional filament.
Dynamic uniformity shaping is accomplished using a flux correction protect between the deposition supply plus the substrate.
Thoughtful Molybdenum evaporation sources style and design of your ion beam focusing optics confines the beam solely to the region on the concentrate on, eradicating any threat of contamination.